growth in TiO2 films prepared by sputtering and
59. Harris J. , Doyle E. D. , Wonga Y. , Munraoe P. R. , evaporation//Thin Solid Films. – 1994. – Vol. Cairney J. M. , Long J. M. Reducing the macro- 251 – P. 72-79. particle content of cathodic arc evaporated TiN 65. Cheng X. , Hu S. , Zeng P. , Kuang T. , Xie G. , Gao
coatings//Surface and Coatings Technology. – F. Structure and properties of TiO2 films prepared
2004. – Vol. 183. – P. 283-294. by ion beam assisted deposition//Surface & Coat-
60. Kleiman A. , Mбrquez A. , Lamas D. G. Anatase ings Technology. – 2007. – Vol. 201. – P. 5552-
TiO2 films obtained by cathodic arc deposition/ 5555.
/Surface & Coatings Technology. – 2007. – Vol. 66. Toma F. , Bertrand G. , Chwa S. , Meunier C. ,
201. – P. 86-91. Klein D. , Coddet C. Comparative study on the
61. Marquez A. , Blanco G. , Fernandez de photocatalytic decomposition of nitrogen oxides
Rapp M. E. , Lamas D. G. , Tarulla R.
Properties using TiO2 coatings prepared by conventional
of cupric oxide coatings prepared by cathodic plasma spraying and suspension plasma spray-
arc deposition//Surf. Coat. Techn. – 2004. – Vol. ing//Surface & Coatings Technology. – 2006. –
187. – P. 154 – 160. Vol. 200. – P. 5855-5862.
62. Lepone A. , Kelly H. , Maґrquez A. Role of me- 67. Modesa T. , Scheffela B. , Metznera Chr. , Zy-
tallic neutrals and gaseous molecular ions in a witzkia O. , Reinholdb T, E. Structure and prop-
copper cathodic arc operated with oxygen gas// erties of titanium oxide layers deposited by re-
J. Appl. Phys. – 2001. – Vol. 90. – P. 3174-3181. active plasma activated electron beam evapora-
63. Grondona D. , Marquez A. , Minotti F. , Kelly H. , tion//Surface & Coatings Technology. – 2005. –
Differences in the metallic plasma-neutral gas Vol. 200. – P. 306-309. structure in a vacuum arc operated with nitro-
gen and argon//J. Appl. Phys. – 2004. – Vol. 96.
– P. 3077-3083.
В. М. Хороших, В. А. Белоус, 2009.
238 ФІП ФИП PSE, 2009, т. 7, № 3, vol. 7, No. 3